Apparatus and related method for forming a substantially flat stereolithographic working surface
US5447822A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 20, 1994 |
| Grant date | Sep 5, 1995 |
| Priority date | — |
| Expiry date | Apr 20, 2014 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29K2995/0073
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
An apparatus and related method for providing a substantially flat working surface of photocurable resin for the formation of a next layer of a stereolithographic part. A substantially flat surface of a rigid member is substantially covered by and spaced from the resin by a substance or film, which is placed in contact with the photocurable resin to form the working surface. Various embodiments are described including where the rigid member is a quartz including a fused silica plate, a bar, a vat wall, the face of a CRT, a fiber-optic bundle, or the bottom of a piston, and also including embodiments where the substance or film is a thin teflon or mylar film, an inert liquid, wax, a thin coating of trichlorosilane or ethoxysilane, or oxygen-saturated resin. Embodiments are also described whereby the next layer is exposed by transmitting solidifying radiation through the member and substance or film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.