X-ray exposure apparatus
US5448612A · kind A · utility
22Cited by
2References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 15, 1994 |
| Grant date | Sep 5, 1995 |
| Priority date | — |
| Expiry date | Jul 15, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70891
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An X-ray apparatus is disclosed which includes a mirror having a reflection surface, for expanding an X-ray beam in a predetermined direction, a detecting device for detecting a relative positional relationship between the X-ray beam and the reflection surface with respect to a direction perpendicular to the reflection surface, and an adjusting device for adjusting the relative position of the X-ray beam and the reflection surface on the basis of the detection. Also disclosed is an exposure apparatus and a semiconductor device manufacturing method using the X-ray apparatus.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.