Light controlled vapor deposition
US5449535A · kind A · utility
5Cited by
0References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jun 13, 1994 |
| Grant date | Sep 12, 1995 |
| Priority date | — |
| Expiry date | Jun 13, 2014 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/18
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method is disclosed for depositing a substance on a substrate, including the following steps: providing the substrate in a deposition chamber, providing in the chamber a vapor of the substance, providing a buffer gas in the chamber, and directing a light beam at the substrate to control deposition of the substance by causing light induced drift.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.