Method for enhancing the toughness of CVD diamond
US5451430A · kind A · utility
38Cited by
3References
17Claims
0Family size
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Key dates
| Filing date | May 5, 1994 |
| Grant date | Sep 19, 1995 |
| Priority date | — |
| Expiry date | May 5, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/30
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A stress relieved CVD diamond is produced by annealing said CVD diamond at a temperature above about 1100 to about 2200 degrees Centigrade in a non-oxidizing atmosphere at a low pressure or vacuum and for a suitable short period of time which decreases with increasing annealing temperature so as to prevent graphitization of said diamond.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.