Apparatus for exposing chemically amplified resist
US5452052A · kind A · utility
4Cited by
3References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 19, 1993 |
| Grant date | Sep 19, 1995 |
| Priority date | — |
| Expiry date | Mar 19, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70891
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for exposing a chemically amplified resist on a semi-conductive substrate comprises the steps of removing a chemically active gas which is chemically active on the chemically amplified resist from an inside of a chamber receiving a light source, the chemically amplified resist and the semiconductor substrate, and exposing at least a part of the chemically amplified resist on the semiconductor substrate to a light from the light source means so that the chemically amplified resist reacts to the light from the light source and is prevented from reacting to the chemically active gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.