Plasma reactor for processing substrates
US5453305A · kind A · utility
81Cited by
8References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 2, 1993 |
| Grant date | Sep 26, 1995 |
| Priority date | — |
| Expiry date | Sep 2, 2013 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01J2219/0894
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma reactor and method for forming a dense plasma from a gas is described incorporating a housing, a gas inlet to the housing, a pump for evacuating the housing, a magnetic coil to generate a magnetic field in the housing, a radio frequency power supply, an electrode or induction coil in the housing, a microwave power supply. The invention overcomes the problem of an upper plasma density limit independent of increases in microwave power.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.