Radiation-sensitive polymers and positive-working recording materials
US5453341A · kind A · utility
78Cited by
7References
1Claims
0Family size
Inventor
Key dates
| Filing date | Jul 12, 1994 |
| Grant date | Sep 26, 1995 |
| Priority date | — |
| Expiry date | Jul 12, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Radiation-sensitive polymers contain, in the polymer main chain, both acid-labile groups and onium salt groups with nonnucleophilic counterions and are suitable for the production of semiconductor structural elements.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.