Vapor deposition method for depositing a film of fluorine-containing glass on a substrate
US5454847A · kind A · utility
37Cited by
1References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 17, 1993 |
| Grant date | Oct 3, 1995 |
| Priority date | — |
| Expiry date | Sep 17, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S65/16
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A deposition method for vapor deposition of a film of fluorine-containing glass on a substrate in which said substrate is put into contact with fluxs of the vapors of the various constituents of said glass, wherein said vapor fluxs are emitted simultaneously from at least two crucibles, a first crucible containing a host bath and main metal fluorides that constitute said fluorine-containing glass, and at least one second crucible containing dopants constituted by at least one rare earth halide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.