Process of activating anti-microbial materials
US5454886A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 18, 1993 |
| Grant date | Oct 3, 1995 |
| Priority date | — |
| Expiry date | Nov 18, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S623/924
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Anti-microbial coatings and powders and method of forming same on medical devices are provided. The coatings are formed by depositing an anti-microbial biocompatible metal by vapour deposition techniques to produce atomic disorder in the coating such that a sustained release of metal ions sufficient to produce an anti-microbial effect is achieved. Preferred deposition conditions to achieve atomic disorder include a lower than normal substrate temperature, and one or more of a higher than normal working gas pressure and a lower than normal angle of incidence of coating flux. Anti-microbial powders formed by mechanical working to produce atomic disorder are also provided. The anti-microbial effect of the coatings or powders may be further activated or enhanced by irradiating with a low linear energy transfer form of radiation such as gamma radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.