Depositing different materials on a substrate
US5454919A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 3, 1993 |
| Grant date | Oct 3, 1995 |
| Priority date | — |
| Expiry date | Dec 3, 2013 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/568
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus and method for depositing multiple layer, thin optical films onto a substrate and an optical filter made thereby. The apparatus includes a vacuum chamber; moving means for moving the substrate between regions of the vacuum chamber; material depositing means within each region for depositing a film of material on the substrate; a reactive substance source for introducing a reactive substance into each region so as to react with the material as it is deposited in that region; and control means for controlling the degree of such reaction in one region relative to the other, to obtain desired stoichiometry in the deposited materials. The method includes moving the substrate between regions; depositing different materials on the substrate in respective regions; introducing a reactive substance into each region so as to react with the material as it is deposited in that region; and controlling degree of reaction in one region relative to that in another region to obtain a desired stoichiometry in the deposited materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.