Patent · US Expired

Method for fabricating a capacitor for a dynamic random access memory cell

US5457063A · kind A · utility

33Cited by
2References
9Claims
0Family size

Assignee

Inventor

Key dates

Filing dateApr 20, 1994
Grant dateOct 10, 1995
Priority date
Expiry dateApr 20, 2014

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D1/043

Abstract

A method for fabricating a capacitor of a dynamic random access memory cell having increased surface area and capacitance of its storage electrode which includes a plurality of vertical protrusions is disclosed. The capacitor includes an electrode plate electrically connected to a field effect transistor formed on a semiconductor substrate through interlayer insulating layers, a plurality of protrusions formed on the electrode plate, side walls respectively formed at side edges of the electrode plate, and a dielectric film and a plate electrode sequentially formed over the entire exposed surfaces of the electrode plate, the protrusions and the side walls.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.