High loop density pin seam
US5458161A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Nov 9, 1994 |
| Grant date | Oct 17, 1995 |
| Priority date | — |
| Expiry date | Nov 9, 2014 |
Classification
- Technology area (CPC D)Textiles; Paper
- CPC primaryD21F1/0054
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A pin seam for use in woven papermaking fabrics, wherein more than 50% of the warp strands from each of the fabric ends are used to form the pintle retaining loops. The loops formed at one of the opposing fabric ends have an "S" orientation, while the loops formed at the second opposing end have a "Z" orientation, thereby allowing the two sets of pintle retaining loops to interdigitate easily. The resulting seam is strong, easily installed on the papermaking machine and has a reduced propensity to mark the paper web. The invention is particularly applicable to fabrics woven using 3-shed weave patterns or integral multiples thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.