Patent · US Expired

Process for the production of electroluminescent silicon structures

US5458735A · kind A · utility

14Cited by
11References
16Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 7, 1994
Grant dateOct 17, 1995
Priority date
Expiry dateFeb 7, 2014

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S438/96
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A process for the production of electroluminescent silicon structures, including: placing a silicon wafer in an acid bath; anodizing the silicon wafer in the acid bath using the apparatus of FIG. 2; illuminating the anode side of the silicon wafer during at least part of the time the silicon wafer is being placed in the acid bath and is being anodized; causing at least some areas of the monocrystalline silicon of the silicon wafer to be converted into a microporous silicon layer; and forming two contacts by means of which a voltage can be applied to the microporous silicon layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.