Method of forming metal material film with controlled color characteristic
US5458928A · kind A · utility
5Cited by
8References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 2, 1993 |
| Grant date | Oct 17, 1995 |
| Priority date | — |
| Expiry date | Jun 2, 2013 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/0676
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The disclosed method of forming a high-function material film such as a ZrN thin film on a substrate in a vacuum chamber allows the color tone and uniformity of the film to be controlled. Gaseous nitrogen and gaseous oxygen, or nitrogen ions and oxygen ions, are supplied to the substrate while hard material atoms such as Zr atoms are emitted from an evaporation source toward the substrate. A supply partial pressure of the gaseous oxygen is set at a value within a range from about 10.sup.-5 Torr to about 10.sup.-4 Torr.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.