Stain-resistant polyamide substrates
US5460887A · kind A · utility
25Cited by
20References
13Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 5, 1995 |
| Grant date | Oct 24, 1995 |
| Priority date | — |
| Expiry date | Jan 5, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2969
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Polyamide substrates treated with stain-resists which comprise blends of maleic anhydride/alpha-olefin polymers and sulfonated phenol-formaldehyde condensation products. Some of the stain-resist blends are water-soluble at low pH, even in the absence of surfactant, and are strongly substantive and more resistant to yellowing than the condensation products.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.