Process for making an array of tapered photopolymerized waveguides
US5462700A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 8, 1993 |
| Grant date | Oct 31, 1995 |
| Priority date | — |
| Expiry date | Nov 8, 2013 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/12195
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention is directed to a process for making an array of tapered photopolymerized waveguides. A photomask having opaque and transparent regions is placed in substantial contact with a substrate having a substantially uniform thickness of photopolymerizable mixture thereon. The photopolymerizable mixture is then exposed through the transparent regions of the photomask to substantially collimated actinic radiation for a time sufficient to form an array of tapered photopolymerized waveguides. The photomask and photopolymerizable mixture which was not substantially polymerized by the substantially collimated actinic radiation are then removed from the substrate. The tapered waveguides are useful as a display means in direct view devices and projection display devices.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.