Plasma processing device comprising plural RF inductive coils
US5464476A · kind A · utility
70Cited by
10References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 17, 1994 |
| Grant date | Nov 7, 1995 |
| Priority date | — |
| Expiry date | Oct 17, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3244
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing device is described which is modular and can be scaled up by assembly together with similar devices to provide a capability for large area processing. The device includes a housing which contains an array of RF coils and into which a process gas is fed. The article to be processed is disposed close to the housing and egress of the process gas from the housing to the process region is resisted so as to maintain a positive pressure differential between the housing and the process region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.