Method of applying single-source molecular organic chemical vapor deposition agents
US5464656A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 2, 1994 |
| Grant date | Nov 7, 1995 |
| Priority date | — |
| Expiry date | Jun 2, 2014 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/18
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Neutral single-source molecular organic precursors containing tetradentate tripodal chelating ligands are provided that are useful for the preparation of films chemical vapor deposition. These complexes can be generally represented by the formula ##STR1## wherein "M" is selected from the group consisting of a lanthanide, an actinide, a Group IIIA metal, a Group IIIA metalloid, a Group IVA metal, a Group IVA metalloid, a Group VA metal, a Group VA metalloid, a Group IIIB metal, a Group IVB metal, a Group VB metal, a Group VIB metal, a Group VIIB metal, and a Group VIIIB metal. The ligand "Z", when present (k=1), is selected from the group consisting of hydrogen, halide, and a group bonded to "M" through N, O, P, S, As, Si, or C. "E.sub.c " is N, P, or As, and m=0-1. When "E.sub.t " is N, P, or As, m=1. When "E.sub.t " is O, S, or Se, m=0. Each "R.sup.1 " is selected from the group consisting of hydrogen, (C.sub.1 -C.sub.20)alkyl, (C.sub.2 -C.sub.20)alkenyl, (C.sub.2 -C.sub.20)alkynyl, (C.sub.6 -C.sub.18)aryl, (C.sub.7 -C.sub.20)aralkyl, a (C.sub.5 .C.sub.18)heterocycle, and triorganosilyl. In --[C(R.sup. 2).sub.2 ].sub.n --, n=1-4, and each "R.sup.2 " is selected from the group cons…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.