Cleaning of emulsion manufacturing apparatus
US5464727A · kind A · utility
0Cited by
3References
5Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 8, 1995 |
| Grant date | Nov 7, 1995 |
| Priority date | — |
| Expiry date | Feb 8, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C11/005
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention is a method for cleaning and preparing photographic manufacturing equipment surfaces. An aqueous solution of potassium iodide and ferric ethylenediamine tetraacetate is prepared. The solution is flushed over the surfaces of the photographic manufacturing equipment removing deposited silver halide and silver. A high purity water flush is then performed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.