Sensor head for use in atomic force microscopy and method for its production
US5465611A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 30, 1994 |
| Grant date | Nov 14, 1995 |
| Priority date | — |
| Expiry date | Mar 30, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/863
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A sensor head (1) is described, which has a spacer (5b) between a carrier element (2) and the spring arm (7), which, perhaps carries a sensor tip (9) at the free end; the spacer defines the distance d between the spring arm (7) and the carrier element (2). In a preferred embodiment, the spacer (5b) comprises a sacrificial layer (5a), which is etched out, except for the spacer (5b), after the formation of a corresponding layer system between the spring arm (7) and the carrier element (2). The carrier element (2) and the spring arm (7) are each provided with a reflecting layer (4 and 6). In accordance with another specific embodiment, plasmonactive layers can also be provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.