Method for producing a silica mask on metal oxide surface
US5466483A · kind A · utility
3Cited by
6References
7Claims
0Family size
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Key dates
| Filing date | Jun 15, 1994 |
| Grant date | Nov 14, 1995 |
| Priority date | — |
| Expiry date | Jun 15, 2014 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC04B41/89
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method for producing a silica mask on metal oxide surface is disclosed. Benzaldehyde is adsorbed on neutral or weak alkaline metal oxide surface, and then tetra-methoxy silane is deposited. The tetra-methoxy silane is hydrolyzed by water vapor into silica and the adsorbed benzaldehyde is removed by NH3 as benzo-nitrile. Thus a silica mask is produced on the metal oxide surface, and the mask has vacancies corresponding to the removed benzaldehyde. The vacancies act as the adsorption sites for shape selective adsorption.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.