Patent · US Expired

Method and apparatus for identification of crystallographic defects

US5466934A · kind A · utility

20Cited by
2References
28Claims
0Family size

Inventors

Key dates

Filing dateJan 18, 1995
Grant dateNov 14, 1995
Priority date
Expiry dateJan 18, 2015

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N23/203
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

An imaging apparatus (10) includes a scanning electron microscope (12) which is controlled to bombard numerous points (62) of a material sample (24) with an electron beam (18). Backscatter diffraction patterns are collected by an image collection system (26) which may include both a slower responding video camera (32) and a faster responding diode array (40). For a baseline point (62), an electron backscatter diffraction pattern collected at the video camera (32) is analyzed to identify representative pixels which reside along Kikuchi bands (78). Backscatter images from subsequent points (62) are rapidly compared (98) with the baseline to detect changes. When changes are not detected, EBSPs are not analyzed. When changes are detected, EBSPs are analyzed to generate new baselines. The resulting collection of analyzed EBSPs are processed (104) to identify microstructure attributes and to characterize defects (64).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.