Patent · US Expired

Low fouling ultrafiltration and microfiltration aryl polysulfone

US5468390A · kind A · utility

39Cited by

4References

11Claims

0Family size

Assignee

Rensselaer Polytechnic Institute · US

Inventors

James V. Crivello · Clifton Park, US
Georges Belfort · Slingerlands, US
Hideyuki Yamagishi · Tokyo, JP

Key dates

Filing date	Dec 22, 1993
Grant date	Nov 21, 1995
Priority date	—
Expiry date	Dec 22, 2013

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC08J2381/06
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A photochemical grafting process permits the attachment of free radically polymerizable monomers to the surface of aryl polysulfone membranes. The process, which does not use sensitizers, results in membrane compositions which can be used for ultrafiltration and microfiltration membranes and which exhibit low or non-fouling characteristics.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.