Patent · US Expired

Process for preparing high-adhesion and high-solubility poly (amide-imide-ester)

US5470936A · kind A · utility

2Cited by
15References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 28, 1993
Grant dateNov 28, 1995
Priority date
Expiry dateMay 28, 2013

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K1/0346
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A high-solubility and high-adhesion poly(amide-imide-ester) resin prepared from a monomer composition comprising: (a) a diisocyanate such as diphenylmethane 4,4'diisocyanate; (b) a trimellitic anhydride; and (c) a bis-anhydride of trimellitic anhydride such as 1,2 bis(trimellitate)ethane dianhydride, dissolved in an appropriate solvent system. Each of the trimellitic anhydride and the bisanhydride of trimellitic anhydride constitutes 1 to 40%, on a molar basis, of the monomer composition and the amount of the diisocyanate is about 1.0 to 1.2 times, also on a molar basis, the sum of the trimellitic anhydride and the bis-anhydride of trimellitic anhydride. In an alternate embodiment, a fourth component (d) diacid such as isophthalic acid can be added to the monomer composition. After the polymerization reaction, the poly(amide-imide-ester) resin so produced can be diluted with a variety of organic solvents, such as xylene and dimethylacetamide, etc., and directly coated onto a copper foil to make polymer/metal laminates without going through an intermediate step involving polyamic acid.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.