Patent · US Expired

Permanent laser conditioning of thin film optical materials

US5472748A · kind A · utility

33Cited by

10References

7Claims

0Family size

Assignee

United States Department of Energy · US

Inventors

C. Robert Wolfe · Palo Alto, US
Mark Kozlowski · Windsor, US
John H. Campbell · Livermore, US
Michael Staggs · Tracy, US
Frank Rainer · Oberhausen, DE

Key dates

Filing date	Oct 15, 1990
Grant date	Dec 5, 1995
Priority date	—
Expiry date	Oct 15, 2010

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC03C2218/32
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The invention comprises a method for producing optical thin films with a high laser damage threshold and the resulting thin films. The laser damage threshold of the thin films is permanently increased by irradiating the thin films with a fluence below an unconditioned laser damage threshold.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.