Magneto-optical display and method of forming such display
US5473466A · kind A · utility
Inventors
Key dates
| Filing date | Jun 2, 1994 |
| Grant date | Dec 5, 1995 |
| Priority date | — |
| Expiry date | Jun 2, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24917
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A thin transparent epitaxial layer of a magnetizable material (e.g. gallium ferrite) is deposited on a substrate of a dielectric transparent material (e.g. gadolinium gallium garnet). A mask made from an oxidizable material (e.g. silicon) deposited on the epitaxial layer covers pixels defining rows and columns and exposes the other areas on the epitaxial layer. The epitaxial layer is then annealed at a suitable temperature (e.g. 500.degree. C.) for a suitable time (e.g. 10 minutes) to oxidize the silicon and reduce the Fe atoms in the pixel areas beneath the mask to Fe.sup.++ ions. This causes the pixel areas beneath the mask to be more easily magnetizable than the other areas in the epitaxial layer. The mask is then removed and a first insulating layer is deposited on the epitaxial layer. A first plurality of windings is then deposited on the first insulated layer in insulating relationship to one another. Each winding extends in a sinuous path in three (3) directions, two (2) oppositely disposed, magnetically coupled to each pixel in an individual one of the columns. A second insulating layer is then deposited on the first windings. A second plurality of windings is then deposite…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.