Inductively coupled plasma mass spectrometer
US5477048A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 10, 1993 |
| Grant date | Dec 19, 1995 |
| Priority date | — |
| Expiry date | Sep 10, 2013 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J49/105
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An inductively coupled mass spectrometer for detecting impurities present in infinitesimal concentrations in a sample. The basic spectrometer structure includes: a nebulizer connected to receive a solution of the sample and a gas for causing the nebulizer to produce a spray in the form of a mist composed of droplets of the sample solution; a spray chamber disposed for receiving the spray and classifying the droplets in the spray; a plasma torch operative for conducting a stream composed of the sample solution and at least one gas; a high frequency power source and a work coil coupled to the plasma torch for supplying energy to generate and maintain a plasma which ionizes the sample solution in the stream; and a mass detector disposed for receiving the ionized sample solution from the plasma torch and operative for detecting impurities in the ionized sample solution. The spray chamber further receives an additional flow of argon gas which acts to suppress the generation of molecular ions in the plasma, so that the analytical performance for detecting impurities, such as Fe or K or the like, is improved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.