Photographic light-sensitive material applicable for rapid processing
US5478709A · kind A · utility
13Cited by
6References
8Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 12, 1994 |
| Grant date | Dec 26, 1995 |
| Priority date | — |
| Expiry date | Sep 12, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/162
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A light-sensitive photographic silver halide material is disclosed comprising a support and on one or both sides thereof at least one silver halide emulsion layer, at least one gelatin antistress layer and, optionally, a substantially gelatin free antistatic surface layer coated thereover, characterised in that said emulsion layer(s) comprise(s) at least one synthetic clay. As a result the said material is less sensitive to roller marks in automatic processing machines.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.