Integrated circuit metal-oxide-metal capacitor and method of making same
US5479316A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 24, 1993 |
| Grant date | Dec 26, 1995 |
| Priority date | — |
| Expiry date | Aug 24, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/435
Abstract
An integrated circuit metal-oxide-metal capacitor and method of making it which involves a support layer; a first conductive electrode on the support layer; a dielectric film on the first conductive electrode; a second conductive electrode disposed on the dielectric film and formed from the first level metallization interconnect layer of the integrated circuit; an interlevel dielectric layer; a first contact via extending through the interlevel dielectric layer and the dielectric film to the first conductive electrode; a second contact via extending through the interlevel dielectric layer to the second conductive electrode; and first and second terminals formed from the second level metallization interconnect layer of the integrated circuit contacting the first and second vias, respectively.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.