Apparatus for supplying CVD coating devices
US5480488A · kind A · utility
341Cited by
6References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 28, 1993 |
| Grant date | Jan 2, 1996 |
| Priority date | — |
| Expiry date | Oct 28, 2013 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/448
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus supplies CVD coating devices with coating gas and includes an intermediate reservoir for accommodation of the gaseous coating material arranged between a storage tank and a coating device. The volume of the reservoir is set to a predetermined, maximum pressure change in the intermediate reservoir upon withdrawal of the mass of gas required for a coating step. The intermediate reservoir can be connected to a gas recovery station.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.