Process for passivating metal surfaces to enhance the stability of gaseous hydride mixtures at low concentration in contact therewith
US5480677A · kind A · utility
32Cited by
7References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 9, 1994 |
| Grant date | Jan 2, 1996 |
| Priority date | — |
| Expiry date | Nov 9, 2014 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C8/80
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A process for passivating a metal surface to enhance the stability of a gas mixture containing one or more gaseous hydrides in low concentration in contact therewith, which comprises: PA1 a) purging gas in contact with said metal surface with inert gas to remove the purged gas, PA1 b) exposing the metal surface to an amount of a gaseous passivating agent comprising an effective amount of a gaseous hydride of silicon, germanium, tin or lead and for a time sufficient to passivate said metal surface, and PA1 c) purging said gaseous passivating agent using inert gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.