Method and apparatus for process control of material emitting radiation
US5481112A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 29, 1994 |
| Grant date | Jan 2, 1996 |
| Priority date | — |
| Expiry date | Aug 29, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/0658
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and apparatus are disclosed for controlling a physical property such as deposited film thickness to a desired value of control in a high temperature process using a desired emissivity power ratio and an emissivity power ratio measured from detected radiation energy. The measured emissivity power ratio is obtained on-line from detection signals of radiation sensors. A desired value of control is converted to the desired emissivity power ratio using predetermined relationships established by theory or experiment. The desired emissivity power ratio and the measured emissivity power ratio are compared to achieve the desired value of control.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.