Apparatus and method for depositing a substance on a rotating surface
US5486380A · kind A · utility
9Cited by
9References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 30, 1993 |
| Grant date | Jan 23, 1996 |
| Priority date | — |
| Expiry date | Dec 30, 2013 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4584
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for depositing a substance includes the following steps: producing a vapor containing constituents of the substance; providing a rotating mandrel assembly that includes a mandrel, having a deposition surface exposed to the vapor so that the substance is deposited on the deposition surface, and a base having a plurality of radiator fins extending therefrom; interleaving a plurality of receptor fins with the radiator fins; and providing heat exchange to the receptor fins to cool the mandrel during deposition of the substance on the deposition surface of the mandrel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.