Negative resists with high thermal stability comprising end capped polybenzoxazole and bisazide

US5486447A · kind A · utility

Assignee

• Siemens Aktiengesellschaft · DE

Inventors

• Albert Hammerschmidt · Erlangen, DE
• Eberhard Kuhn · Hemhofen, DE
• Erwin Schmidt · Baltmannsweiler, DE

Key dates

• Filing date: Oct 27, 1994
• Grant date: Jan 23, 1996
• Expiry date: Oct 27, 2014

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/107
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Cost-effective, negative resists having high thermal stability based on oligomeric and/or polymeric polybenzoxazole precursors are disclosed. Also disclosed are resist solutions having a high level of storage stability when they contain a photoactive component in the form of a bisazide and when the polybenzoxazole precursors are hydroxypolyamides having the following structure: ##STR1## where R, R*, R.sub.1, R.sub.1 * and R.sub.2 are aromatic groups, R.sub.3 is an aromatic group or a norbornene residue, and wherein n.sub.1, n.sub.2 and n.sub.3, are defined as follows: PA1 n.sub.1 =1 to 100, n.sub.2 and n.sub.3 =0 or PA1 n.sub.1 and n.sub.2 =1 to 100, n.sub.3 =0 or PA1 n.sub.2 =1 to 100, n.sub.1 and n.sub.3 =0 or PA1 n.sub.1, n.sub.2 and n.sub.3 =1 to 100 (with R.noteq.R* or R.sub.1 .noteq.R.sub.1 * or both) or PA1 n.sub.1 and n.sub.3 =1 to 100, n.sub.2 =0 (with R.noteq.R* or R.sub.1 .noteq.R.sub.1 * or both), PA1 on the condition that: n.sub.1 +n.sub.2 +n.sub.3 .gtoreq.3.