High purity polyhydrogen silsesquioxane resin for electronic coatings
US5486564A · kind A · utility
20Cited by
3References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 13, 1995 |
| Grant date | Jan 23, 1996 |
| Priority date | — |
| Expiry date | Feb 13, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08G77/36
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Disclosed is a highly reproducible method for the molecular weight fractionation of polyhydrogen silsesquioxane that gives a very storage-stable polyhydrogen silsesquioxane having a freely selectable molecular weight. The method involves dissolving polyhydrogen silsesquioxane in active-hydrogen-free nonpolar solvent; adding an active-hydrogen-free polar solvent to the resulting solution in order to precipitate polyhydrogen silsesquioxane; and collecting the desired molecular weight fraction of polyhydrogen silsesquioxane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.