Process and device for the continuous treatment of silicon

US5490162A · kind A · utility

Assignee

• Anton More · DE

Inventors

• Anton More · Burghausen, DE
• Karl Hutzler · Burghausen, DE
• Rudolf Koch · Oberhaching, DE

Key dates

• Filing date: Jan 3, 1994
• Grant date: Feb 6, 1996
• Expiry date: Jan 3, 2014

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C01B33/037
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

The invention relates to a process for the continuous treatment of silicon in which a slag in a pivotable low-shaft furnace (1) with a discharge pipe (4) reaching the bottom of the furnace tank is taken to a temperature of 1450.degree. to 1800.degree. C. and this slag is used to melt solid silicon and/or liquid silicon is continuously refined and the liquid refined silicon is then sprayed with compressed air or nitrogen (7) and continuously conveyed into a transport crucible (11) by being poured into a stream of water (9) in the channel (8) via a dewatering filter (10) and thus obtained in granular form. The invention also relates to devices for implementing the process.