Low temperature chemical vapor deposition of protective coating containing platinum
US5494704A · kind A · utility
16Cited by
2References
10Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 3, 1994 |
| Grant date | Feb 27, 1996 |
| Priority date | — |
| Expiry date | Oct 3, 2014 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/30
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method is disclosed to deposit aluminum and platinum on substrates for improved corrosion, oxidation, and erosion protection. Low temperature chemical vapor deposition is used. A homogeneous biphase coating of aluminum and platinum may be deposited, as well as sequential layers of aluminum and platinum.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.