Method of making a perovskite thin-film ink jet transducer
US5500988A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 13, 1994 |
| Grant date | Mar 26, 1996 |
| Priority date | — |
| Expiry date | Jun 13, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49401
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
In the particular embodiments described in the specification, a thin-film PZT piezoelectric transducer ink jet head is prepared by oxidizing one surface of a silicon wafer to provide a dielectric layer, forming electrodes on the layer by photoresist processing techniques, depositing one or more layers of perovskite-seeded PZT material to provide a thin-film piezoelectric layer having a thickness in the range of 1-25 microns, forming another pattern of electrodes on the surface of the PZT layer by photoresist techniques, and selectively etching the silicon substrate in the region of the electrodes to provide an ink chamber. Thereafter, an orifice plate is affixed to the substrate to enclose the ink chambers and provide an ink orifice for each of the chambers. An ink jet head having chambers 3.34 mm long by 0.17 mm wide by 0.15 mm deep and orifices spaced by 0.305 mm is provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.