Patent · US Expired

Hologram manufacturing method and apparatus

US5502581A · kind A · utility

10Cited by
8References
9Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 18, 1994
Grant dateMar 26, 1996
Priority date
Expiry dateNov 18, 2014

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03H2240/51
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A hologram manufacturing apparatus and a hologram manufacturing method for manufacturing a hologram optical device by a split exposure method are disclosed. The manufacturing apparatus comprises light shield means having a spatial light modulator having a light transparent area and a light non-transparent area thereof controlled corresponding to an input signal, and drive means for driving the spatial light modulator by supplying the signal to the spatial light modulator. The light shield means is arranged closely to a photosensitive material.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.