Color filters and their preparation
US5502595A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 3, 1994 |
| Grant date | Mar 26, 1996 |
| Priority date | — |
| Expiry date | Jun 3, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/285
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A color filter comprising a transparent substrate and two or more multilayer films of amorphous silicon materials deposited on said substrate, each film being different, each layer of said two or more multi-layer films having a thickness less than the wavelength of the visible light and at least three layers of said two or more multi-layer films of amorphous silicon materials in an alternate arrangement wherein the amorphous silicon materials are selected from a-SiOx and a-SiNx is described. A method of preparing the color filter comprising depositing on the substrate by PECVD method two or more multilayer films is also described. The color filters prepared by PECVD method have a more compact texture and a better environmental resistant. The PECVD method for the preparation of the filters is more efficient than conventional methods.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.