Method for low temperature chemical vapor deposition of aluminides containing easily oxidized metals
US5503874A · kind A · utility
34Cited by
5References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 30, 1994 |
| Grant date | Apr 2, 1996 |
| Priority date | — |
| Expiry date | Sep 30, 2014 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/30
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method is disclosed to deposit aluminum and a metal oxide on substrates for improved corrosion, oxidation, and erosion protection. Low temperature chemical vapor deposition is used. A homogeneous biphase coating may be deposited, as well as layers of aluminum and metal oxides.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.