Process for preparing disilane from monosilane by electric discharge and cryogenic trapping and new reactor for carrying it out
US5505913A · kind A · utility
6Cited by
10References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 5, 1995 |
| Grant date | Apr 9, 1996 |
| Priority date | — |
| Expiry date | Jun 5, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S422/906
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The invention relates to a process for producing disilane from monosilane, according to which gaseous monosilane is passed into a reaction zone where it is subject to an electric discharge generated by a high-frequency current.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.