Method of applying a lacquer film sensitive to ultraviolet and/or electron radiation

US5506008A · kind A · utility

Assignee

• Max-Planck-Gesellschaft zur Föderung der Wissenschaften e.V. · US

Inventors

• Armin Klumpp · Hersbruck, DE
• Erwin Hacker · Hochheim, DE

Key dates

• Filing date: Jul 19, 1994
• Grant date: Apr 9, 1996
• Expiry date: Jul 19, 2014

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/02208
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Lacquer films sensitive to ultraviolet (UV) and/or electron beam radiation re applied to substrates as masking layers by a process known as the "spin on process". This invention is a new method of applying a lacquer film sensitive to UV and/or electron beam radiation. A vinyl-containing substance and a linear or cyclic siloxane are vaporized and then deposited onto the substrate to be masked. In the preferred embodiment of the invention, the substances utilized are octamethylcyclotetrasiloxane and trivinylmethylsilane.