Stereolithography using vinyl ether based polymers
US5506087A · kind A · utility
18Cited by
11References
36Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 20, 1994 |
| Grant date | Apr 9, 1996 |
| Priority date | — |
| Expiry date | Apr 20, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/027
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Polymer precursor formulations suitable for stereolithography may be prepared from compositions containing (a) a vinyl ether oligomer, and (b) mono and/or multifunctional vinyl ether monomers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.