Method of detecting positional displacement between mask and wafer, and exposure apparatus adopting the method
US5508527A · kind A · utility
41Cited by
6References
11Claims
0Family size
Assignee
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Key dates
| Filing date | Sep 1, 1994 |
| Grant date | Apr 16, 1996 |
| Priority date | — |
| Expiry date | Sep 1, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01Q80/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and apparatus for detecting the relative positional displacement between a mask and a wafer. The mask is provided with a cantilever. The position mark is provided on the wafer so as to face the cantilever. A relative positional displacement between the mask and the wafer is detected from a deformation amount of the cantilever based on a force acting between the position mark and the cantilever upon relative movement of the position mark and the cantilever.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.