Stereolithography using vinyl ether-epoxide polymers
US5510226A · kind A · utility
57Cited by
7References
33Claims
0Family size
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Key dates
| Filing date | Apr 20, 1994 |
| Grant date | Apr 23, 1996 |
| Priority date | — |
| Expiry date | Apr 20, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0385
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Polymer precursor formulations suitable for stereolithography may be prepared from compositions containing vinyl ether functionalized compounds and epoxy functionalized compounds plus an effective amount of a cationic photoinitiator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.