Micro-pattern measuring apparatus
US5512746A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Sep 21, 1994 |
| Grant date | Apr 30, 1996 |
| Priority date | — |
| Expiry date | Sep 21, 2014 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2814
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A scanning electron microscope scans a sample with an electron beam in a transverse direction, to measure the size of the sample. The microscope has an electron gun for emitting an electron beam, a scan coil and an electron lens for periodically deflecting the electron beam, a detector for detecting a secondary electron signal, a unit for measuring the size of the sample according to the secondary electron signal and displaying the sample, and a probe for catching charged electrons on the sample. This microscope correctly measures the size of a sample that is made of easily-charged material such as photoresist or insulation material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.