Pressure pulse cleaning
US5514220A · kind A · utility
Inventors
Key dates
| Filing date | Dec 9, 1992 |
| Grant date | May 7, 1996 |
| Priority date | — |
| Expiry date | Dec 9, 2012 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B7/0021
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present invention is a method which relies on pressure pulse cleaning. By "pressure pulse cleaning" it is meant that the pressure and temperature of a fluid, such as carbon dioxide is raised to near or above supercritical conditions, which is then contacted with the item(s) to be cleaned. Periodically, the pressure of the supercritical fluid is pulsed or spiked to higher levels and returned to substantially the original level. Potential candidates for treatment by the present invention include but are not limited to precision parts such as gyroscopes used in missile guidance systems, accelerometers, thermal switches, nuclear valve seals, electromechanical assemblies, polymeric containers, special camera lenses, laser optics components, and porous ceramics.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.