Method of on-press developing lithographic plates utilizing microencapsulated developers
US5516620A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 1, 1993 |
| Grant date | May 14, 1996 |
| Priority date | — |
| Expiry date | Nov 1, 2013 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41C2210/24
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic printing plate for use on a printing press, with minimal or no additional processing after exposure to actinic radiation, comprises a printing plate substrate, a polymeric resist layer capable of imagewise photodegradation or photohardening, and a plurality of microencapsulated developers capable of blanket-wise promoting the washing out of either exposed or unexposed areas of the polymeric resist. The microencapsulated developers may be integrated into the polymeric resist layer, or may form a separate layer deposited atop the polymeric resist layer, or may be coated onto a separate sheet support capable of being brought into face-to-face contact with conventional printing plates.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.