Patent · US Expired

Method of processing a photosensitive material and photosensitive material processor

US5518844A · kind A · utility

4Cited by
4References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 5, 1994
Grant dateMay 21, 1996
Priority date
Expiry dateOct 5, 2014

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03C7/3041
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

In a first processing step, whether a first photosensitive material is a particular photosensitive material is detected. If it is detected at least that the first photosensitive material is the particular photosensitive material, processing conditions in the first processing step are recorded in a predetermined position on the first photosensitive material. Exposure conditions in the exposure step are set in accordance with one of the result of the detection and the processing conditions recorded on the first photosensitive material. The second photosensitive material is exposed under the set exposure conditions. If the first photosensitive material is detected to be a particular photosensitive material, the setting of the exposure conditions is changed in the exposure step, and the exposure conditions are set in such a manner as to compensate the difference in the characteristic occurring in the image of the particular first photosensitive material depending on standard processing and particular processing. Accordingly, even in the case of a photosensitive material requiring particular processing, it is possible to form an image of fixed quality.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.